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CP307(2002) Даташит - Central Semiconductor

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CP307

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Central-Semiconductor
Central Semiconductor Central-Semiconductor

PROCESS DETAILS

Process EPITAXIAL PLANAR
Die Size 27 x 27 MILS
Die Thickness 9.0 MILS
Base Bonding Pad Area 5.3 x 3.8 MILS
Emitter Bonding Pad Area 5.3 x 6.5 MILS
Top Side Metalization Al - 30,000Å
Back Side Metalization Au - 18,000Å

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