The Multiband Plasma-Process Monitor (MPM) is a system specifically designed for monitoring the optical plasma emissions that are created during the various manufacturing processes of semiconductors including etching, sputtering, cleaning, and CVD. The MPM can handle multi-channel recording in real-time.

• Simultaneous measurement from 200 to 950 nm
• Easy measurement using optical fiber input
• High levels of accuracy and reliability
• Software for measurement, analysis and factory integration